photoresist

n.

光致抗蚀剂；感光性树脂；光刻胶；光阻材料

1. The groove width is reduced by employing a slope-etching process to form the photoresist pattern.
   通过采用倾斜蚀刻工艺形成光致抗蚀剂图案，从而减小了凹槽的宽度。
2. A method of removing a photoresist or a photoresist residue from a semiconductor substrate is disclosed.
   公开了从半导体基底上去除光致抗蚀剂或者光致抗蚀残留物的一种方法。
3. Thereafter, the patterned photoresist layer is removed.
   此后，移除图案化光刻胶层。
4. Rectangular photoresist gratings can be fabricated by taking advantage of the nonlinearity of photoresist.
   利用光刻胶的非线性效应可以制作出了矩形的全息光栅。

Photoresist
Characterization of positive photoresist
SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography
The manufacture of microlenses by melting photoresist
Micromachining applications of a high resolution ultrathick photoresist
High-aspect-ratio, ultrathick, negative-tone near-uv photoresist for MEMS applications
High-aspect-ratio, ultrathick, negative-tone near-uv photoresist for MEMS applications
Greiner, C.: SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography. J. Micromech. Microeng. 17, R81-R95
High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS
Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresist